IMPACT OF DEVICE PARAMETERS OF TRIPLE GATE SOI-FINFET ON THE PERFORMANCE OF CMOS INVERTER AT 22NM

Prathima. A1, Kiran Bailey 2 , K.S.Gurumurthy 3

1, 2 Department of Electronics and Communication Engineering, BMSCE, Bangalore

3Department of ECE, UVCE, Bangalore University, Bangalore

ABSTRACT

A simulation based design evaluation is reported for SOI FinFETs at 22nm gate length. The impact of device parameters on the static power dissipation and delay of a CMOS inverter is presented. Fin dimensions such as Fin width and height are varied. For a given gate oxide thickness increasing the fin height and fin width degrades the SCEs, while improves the performance. It was found that reducing the fin thickness was beneficial in reducing the off state leakage current (IOFF), while reducing the fin height was beneficial in reducing the gate leakage current (IGATE). It was found that Static power dissipation of the inverter increases with fin height due to the increase in leakage current, whereas delay decreased with increase fin width due to higher on current. The performance of the inverter decreased with the downscaling of the gate oxide thickness due to higher gate leakage current and gate capacitance.

KEYWORDS

DIBL, Process and Device simulation, SCEs, SOI FinFETs, Sub threshold Slope, TCAD 

Original Source Link : http://aircconline.com/vlsics/V3N5/3512vlsics07.pdf

http://airccse.org/journal/vlsi/vol3.html